(I) Overview of the Plan
Semiconductor chips, wafer manufacturing, photolithography and etching, packaging testing and other processes require the highest level of industrial water quality. Trace ions, dissolved gases, organic carbon, nanoscale particles, and trace silicon boron impurities in water can directly lead to wafer oxidation, photolithography defects, circuit breaks, and a sharp drop in chip yield. This solution adopts high-end technology exclusive to the semiconductor industry: enhanced pretreatment+dual stage RO reverse osmosis+membrane degassing+EDI deep desalination+high-end polishing mixed bed+terminal precision refining full membrane purification process, customized for high-end scenarios such as 12 inch wafers, semiconductor chips, precision lithography, advanced packaging, etc., stable and continuous output of 18.25M Ω· cm (theoretical pure water level) ultra pure water, impurity control reaching PPT trillion level standard, fully matching the strict water requirements of semiconductor mass production.
The entire system adopts modular integrated design and fully automatic intelligent closed-loop operation, with no acid-base regeneration pollution. It operates continuously for 72 hours with minimal water quality fluctuations and is compatible with the 24-hour uninterrupted production mode of semiconductor factories. The entire process of equipment production, construction, operation and maintenance complies with the ISO three standard system standards and can meet the requirements of high-end factory acceptance, bidding, qualification filing, and supporting use in clean rooms.
(II) Applicable industries and water standards
1. Applicable scenarios
High end scenarios such as semiconductor wafer cutting, photolithography and etching, thin film deposition, ion implantation, chip cleaning, 12 inch advanced wafer manufacturing, semiconductor packaging and testing, precision semiconductor laboratory, integrated circuit research and development production, etc.
2. Exclusive ultra-high water quality indicators for semiconductors
Ultra pure water resistivity: 18.25 M Ω· cm (stable at 25 ℃)
Conductivity: ≤ 0.055 μ S/cm
Overall desalination rate: ≥ 99.995%
Nanoparticles (≥ 0.05 μ m):<0.1 particles/mL
TOC total organic carbon: ≤ 1pppb (chip level strict standard)
Silicon content: ≤ 0.1ppb, boron content: ≤ 0.05ppb
Dissolved oxygen: ≤ 5ppb, no heavy metals, sterile, no residual chlorine, no trace colloidal impurities
Water quality stability: Continuous 72 hour operation with resistivity fluctuation ≤ 0.1M Ω· cm
(I) Core process flow (top-level process dedicated to semiconductor chips)
Raw water → Raw water pump → Multi media filtration → Activated carbon filtration → Fully automatic water softener → Precision security filtration → Primary RO reverse osmosis → Secondary RO reverse osmosis → Membrane degassing system → EDI ultra pure water module → UV-TOC deep degradation sterilization → High end polishing mixed bed → 0.05 μ m ultra precision terminal filtration → Constant temperature and pressure closed-loop water supply to the clean room
Core role of each section (semiconductor customization upgrade)
1. Strengthening the preprocessing system (core protection, eliminating backend pollution) adopts a multi-stage gradient filtration process, and quartz sand filtration thoroughly removes sediment, suspended solids, and large molecular colloids; High quality activated carbon deeply adsorbs residual chlorine, abnormal color and odor, and large molecular organic compounds; The fully automatic water softener accurately reduces the hardness of raw water, eliminates scaling and blockage of RO and EDI membranes from the source, avoids trace amounts of calcium and magnesium impurities from entering high-end purification units, ensures long-term stable operation of precision equipment in the back-end, and significantly reduces the loss of high-end consumables.
2. The dual stage RO reverse osmosis system (high-precision pre desalination) operates in series with high and low pressure dual stage reverse osmosis, with a desalination rate of over 99.9%. It efficiently removes the vast majority of inorganic salts, heavy metals, fine particles, and large molecular impurities in water, accurately stabilizes the EDI inlet water quality, and avoids the back-end purification failure caused by water quality fluctuations. It is an indispensable pre core process for the preparation of semiconductor ultrapure water.
3. The membrane degassing system (semiconductor exclusive upgrade) is designed to remove dissolved gases such as oxygen and carbon dioxide from water, eliminate surface oxidation and coating defects caused by gas impurities, and solve the gas pollution problem that cannot be avoided by ordinary electronic pure water processes. It is suitable for high-precision processes such as photolithography and coating.
4. The EDI continuous electric desalination (core deep desalination unit) adopts a high-end EDI membrane stack, which does not require acid-base chemical regeneration and does not discharge hazardous waste liquids. It continuously and deeply strips trace ions from water through an electric field, and stably produces high-purity pure water of over 15M Ω· cm, replacing traditional acid-base mixed bed processes, ensuring pollution-free environment, constant water quality, and adapting to the continuous production needs of semiconductor factories.
5. UV-TOC deep precision treatment (removal of trace organic matter) is equipped with high-end TOC ultraviolet degradation equipment, which accurately decomposes trace organic carbon impurities in water, strictly controls the TOC index within 1 ppb, and completely solves the problems of chip surface defects and poor packaging caused by residual organic matter in semiconductor production, achieving chip level pure water purity requirements.
6. High end polishing mixed bed+ultra precision terminal filtration food grade high-end polishing resin deep purification, stripping trace amounts of silicon, boron, metal ions and other ultrafine impurities from water; Paired with a 0.05 μ m ultra precision terminal filter, it intercepts nanoscale particles and achieves water quality that infinitely approaches the theoretical pure water standard.
7. Constant temperature and constant pressure fully closed-loop water supply (essential for semiconductors) eliminates static storage of pure water, fully enclosed closed-loop circulation, and is equipped with a constant temperature control system to prevent air carbon dioxide and dust from dissolving and polluting water quality, ensuring constant and non deteriorating water quality at all water points in the dust-free workshop and eliminating batch production defects.
(IV)The high-end configuration list of the entire equipment strengthens the pre-processing unit: carbon steel lined rubber anti-corrosion sand filter, carbon filter, fully automatic soft water tank, equipped with intelligent automatic multi way valve, fully automatic backwashing, forward washing, regeneration, without manual intervention
Pre precision protection: 5 μ m/1 μ m dual stage 304 stainless steel security filter, gradient interception of impurities, all-round protection of high-end membrane components at the back end
Dual stage reverse osmosis system: variable frequency high-pressure pump, sanitary stainless steel membrane shell, imported high-end anti pollution RO membrane, intelligent concentrated water recovery system, water-saving and energy-saving, desalination stability
Semiconductor exclusive degassing unit: professional membrane degassing device, precise removal of dissolved oxygen and carbon dioxide, suitable for high-precision process water
EDI Ultra Pure Water Core Unit: High end High Purity Water resistant EDI Membrane Stack, Intelligent Rectification Power Supply, High precision Flow and Pressure Protection Components, Continuous and Stable Deep Desalination
Deep precision processing unit: TOC dedicated UV degradation sterilizer, high-end nuclear grade polishing mixed bed, 0.05 μ m ultra precision terminal sterilization filter
Aseptic water storage unit: Fully sealed dust-proof stainless steel sterile pure water tank, eliminating secondary pollution, compatible with dust-free workshop supporting standards
Intelligent self-control system: Customized high-end electrical control cabinet, equipped with high-precision resistivity/TOC online monitoring instruments, fully automatic start stop, high and low voltage/water shortage/full water multiple protection, automatic fault alarm, real-time data recording, optional 4G remote monitoring, data traceability function
Water supply circulation unit: variable frequency constant pressure water supply pump, food grade sterile closed-loop circulation pipeline, constant temperature and pressure water supply, no water quality degradation
